Semiconductor Production

Vacuum plasma has been used for many applications in the
semiconductor industry. In the Openair-Plasma® process,
a “reactive plasma zone” integrated into the plasma unit
makes it possible to carry out continuous pretreatment
during the ongoing production process. The potential-free
Openair-Plasma® microfine cleaning system is ideal for
the production of highly sensitive electrical components,
replacing the vacuum chamber in the production of chip
packaging in a much more efficient and cost-effective way.