A newly invented material manufacturing process, which can significantly cut down the energy uses and revolutionise the semiconductor industry. The method for making semiconductor materials at low temperature is based on substrates having to undergo some initial preparatory steps prior to the deposition of silicon, at temperatures less than 400°C. Using this process, we are able to deposit silicon structures on plastic/glass substrates and have demonstrated their use in electronic and energy related devices. The manufacturing method will speed up access to affordable and clean energy globally.